Sr Technology Specialist

Cymer   •  

San Diego, CA

Industry: Semiconductors


Less than 5 years

Posted 272 days ago

This job is no longer available.

The Technology Development team at Cymer/ASML drives forward-looking technology identification and proof-of-concept demonstration for next-generation Extreme Ultraviolet (EUV) light sources based on laser-produced plasma (LPP) to power the roadmap for the most advanced lithography tools used in the semiconductor industry.

We are looking for technology specialists who are passionate and innovative problem solvers with demonstrated ability to utilize your excellent practical skills backed up with deep understanding of your area of subject matter expertise. You will bring that expertise and passion to work on complex problems in EUV source development to define new technical directions for advancing the state-of-the-art in EUV source technology. Since many of the challenges in EUV source technology are multi-disciplinary, your eagerness and adaptability to expand your knowledge base into related technology areas and quickly apply that new learning to drive rapid progress will be a significant asset.

As part of the Technology Development team, you will be challenged and rewarded as you work alongside other talented and creative technologists, conceiving and demonstrating technologies that are essential for pushing the limits of Moore’s Law. Just think – you will be able to tell your friends that you work on critical technologies that ultimately enable newer, smarter consumer electronics!


The core of the Extreme Ultraviolet (EUV) lithography light source is the laser-produced plasma (LPP) that is optimized for maximum emission of EUV light. Successful engineering of the source requires deep physical understanding of the plasma generation process throughout the entire plasma lifecycle – from high power laser development attuned to efficient plasma production, through details of the plasma processes leading to EUV radiation production, as well as the ejected debris from the plasma event. Successful scaling of source performance requires that understanding to be translated into practical and realizable improvements in source hardware and controls strategies.

This position will focus on delivering increased understanding in at least one of the following technology areas:

  1. Development / characterization of high-power short-pulse CO2 lasers capable of efficient laser-plasma generation, including innovative metrology of critical laser characteristics;
  2. Investigation / characterization of the laser-produced plasma used for EUV generation with particular focus on its scalability, again with particular emphasis on innovative metrology to gain improved visibility of critical plasma parameters to build increased physical and practical understanding of existing and future plasma recipes;
  3. High-precision optical metrology, such as may be required for concentration measurements of atoms / ions / clusters / microparticles;
  4. Experimental and/or computational investigation of the dynamics of gas flow in an EUV source in the presence of the plasma heat / debris source, with specific focus on understanding how flow design impacts the behavior of plasma debris.


  1. Work independently or with otherTechnology Development scientists on conceiving, designing, executing, and analyzing the results of experiments on EUV LPP sources (or, where appropriate, simulations of these sources) targeted towards increasing understanding of our EUV source and developing more capable sources, in one of the following areas – drive laser design and scaling, plasma recipe design, and plasma debris management.
  2. On the basis of learning generated by the activities described above, suggest and evaluate potential technology (hardware / software) improvements to the source.
  3. Where appropriate and as directed, summarize the work undertaken and clearly present the outcomes to either peer groups or towards management.
  4. Also where appropriate and as directed, document the learning from activities to ensure effective knowledge capture for the company
  5. Finally, if protectable Intellectual Property is generated in the course of the above activities, the candidate will work with corporate IP to ensure that the Intellectual Property is appropriately captured.

Job Requirements:

  1. Minimum educational requirement is MS in physics or electrical engineering in a relevant subject matter area.
  2. Minimum 3years practicalexperience in one or more of the followingtechnologyareas:
    1. Laser design / development / metrology
    2. Laser-produced plasma generation / characterization;
    3. High-precision optical metrology development;
    4. Compressible fluid flow diagnostics and/or computational analysis of compressible fluid flow;
  3. Demonstrated ability to manage a research project involving multiple stakeholders;
  4. Demonstrated capability to clearly communicate research outcomes to both peers and management, with an ability to adapt the messaging to suit the audience


The physical demands described here are representative of those that must be met by an employee to successfully perform the essential functions of this job. Reasonable accommodations may be made to enable individuals with disabilities to perform the essential functions.

  • While performing the duties of this job, the employee routinely is required to sit; walk; talk; hear; use hands to keyboard, finger, handle, and feel; stoop, kneel, crouch, twist, reach, and stretch.
  • The employee is occasionally required to move around the campus. 
  • The employee may occasionally lift and/or move up to 20 pounds.
  • May require travel dependent on business needs.
  • Specific vision abilities required by this job include close vision, color vision, peripheral vision, depth perception, and ability to adjust focus.
  • Can work under deadlines.